ASML, ARCNL and TU Delft find e-beam metrology funding
The Dutch Research Council (NWO) has awarded a grant to Delft University of Technology (TU Delft), ARCNL and ASML to improve e-beam inspection in semiconductor manufacturing.
Bedrijf: Arcnl
ARCNL director Frenken moves to University of Groningen
Director Joost Frenken has announced his departure from research institute ARCNL.
Vici grant for EUV nano-imaging research at ARCNL
ARCNL and VU group leader Stefan Witte has been awarded a 1.5-million-euro Vici grant from the Dutch Research Council (NWO).
Performing an ultrasound on a wafer to align it
The markers used as ‘beacons’ to precisely position wafers during semiconductor manufacturing may become hard to find after several chip layers have been deposited on them. Researchers at ARCNL may have found a way to spot them: using acoustic waves.
EUV-emitting tin plasma still harbors surprises
While EUV lithography is already being used to manufacture chips, the details of how the light is generated from a superheated drop of tin haven’t been elucidated.
Amsterdam fiber microscope beats speed and resolution limit
Researchers at ARCNL and the Vrije Universiteit Amsterdam have developed a fiber-based microscopy system that beats the theoretical limits of resolution and speed.
ERC grants consolidation to lowland science stars
The European Research Council (ERC) has announced the winners of its latest Consolidator Grant competition.
Oostenrijker Bliem leidt oppervlakte- en materialengroep Arcnl
Onderzoeksinstituut Arcnl heeft Roland Bliem aangesteld als groepsleider van de nieuwe Materials and Surface Science for EUV Lithography-groep.
Twee onderzoeksgroepen bij Arcnl gestaakt onder druk van ASML
Researchinstituut Arcnl bouwt twee onderzoeksgroepen af omdat cofinancier ASML ze niet relevant genoeg vindt, bericht NRC Handelsblad.
